dc.contributor.advisor	Hernández Aranda, Raúl Ignacio	en_US
dc.contributor.advisor	García Ortíz, César Eduardo	en_US
dc.contributor.author	Orejel Orejel, Robin	en_US
dc.contributor.committeemember	Cortés Martínez, Rodolfo	en_US
dc.contributor.committeemember	López Mago, Dorilián	en_US
dc.date.accessioned	2018-05-18T17:19:47Z
dc.date.available	2018-05-18T17:19:47Z
dc.date.issued	2017-05-16
dc.description.abstract	In this thesis we present a method to determine the thickness of dielectric thin films (<100 nm). The thickness of four magnesium-fluoride (MgF2) thin films of different thicknesses is accurately determined by detecting the angle at which surface plasmon resonance (SPR) occurs. The experiment consists of the measurement of the attenuated total internal reflection using an optical setup based on the Kretschmann configuration. Curves from a theoretical model for multilayer thin film resonance are used to fit the experimental results in order to obtain the dielectric film thickness. Additionally, we calculated numerically the dispersion relation for an insulator-insulator-metal-insulator (IIMI) structure and determined the experimental range of parameters where the system is the most sensitive.
dc.identifier.uri	http://hdl.handle.net/11285/629701
dc.language.iso	eng	en_US
dc.rights	Open Access	en_US
dc.rights.uri	http://creativecommons.org/licenses/by/4.0/	*
dc.subject.discipline	Ciencias / Sciences	en_US
dc.subject.keyword	SPR	en_US
dc.subject.keyword	Dielectric thickness	en_US
dc.subject.keyword	Thin-films	en_US
dc.subject.keyword	Surface Plasmon Resonance	en_US
dc.subject.keyword	electrónica	en_US
dc.subject.keyword	engineering	en_US
dc.title	Thickness measurement and optical characterization of dielectric thin-films using surface plasmon resonance	en_US
dc.type	Tesis de maestría
html.description.abstract	<html> <head> <title></title> </head> <body> <p>In this thesis we present a method to determine the thickness of dielectric thin films (<100 nm). The thickness of four magnesium-fluoride (MgF2) thin films of different thicknesses is accurately determined by detecting the angle at which surface plasmon resonance (SPR) occurs. The experiment consists of the measurement of the attenuated total internal reflection using an optical setup based on the Kretschmann configuration. Curves from a theoretical model for multilayer thin film resonance are used to fit the experimental results in order to obtain the dielectric film thickness. Additionally, we calculated numerically the dispersion relation for an insulator-insulator-metal-insulator (IIMI) structure and determined the experimental range of parameters where the system is the most sensitive.</p> </body> </html>	en_US
refterms.dateFOA	2018-05-18T17:19:48Z
thesis.degree.discipline	School of Engineering and Sciences	en_US
thesis.degree.grantor	Instituto Tecnológico y de Estudios Superiores de Monterrey	es
thesis.degree.level	Master in Science in Electronic Engineering	en_US
thesis.degree.name	Maestría en Ciencias con Especialidad en Ingeniería Electrónica	en_US
thesis.degree.program	Campus Monterrey	en_US

Thickness measurement and optical characterization of dielectric thin-films using surface plasmon resonance

Files

Original bundle

License bundle

Collections